CONFERENCE PROCEEDINGS
Advanced Search
Eunchul Choi
at KAIST
SPIE Involvement:
Author
Publications (2)
Proceedings Article | 30 July 2002 Paper
Simulation and characterization of silicon oxynitrofluoride films as a phase-shift mask material for 157-nm optical lithography
SungKwan Kim, Eunchul Choi, Hyoungdo Kim, Jungmin Kim, Kwangsoo No
Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474558
KEYWORDS: Transmittance, Silicon, Refractive index, Phase shifts, Fluorine, Argon, Silicon films, Photomasks, Oxygen, Nitrogen
Proceedings Article | 11 March 2002 Paper
High transmittance attenuated phase shifting mask of chromium aluminum oxynitride
Eunchul Choi, Eunah Kim, Hyoungdo Kim, Yong-Hoon Kim, Huyong Tian, Kwangsoo No
Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458281
KEYWORDS: Aluminum, Transmittance, Chromium, Refractive index, Etching, Argon, Optical properties, Phase shifting, Metals, Inspection
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top