Eunchul Choi
at KAIST
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 30 July 2002
Proc. SPIE. 4691, Optical Microlithography XV
KEYWORDS: Refractive index, Argon, Silicon, Nitrogen, Oxygen, Silicon films, Transmittance, Photomasks, Fluorine, Phase shifts

Proceedings Article | 11 March 2002
Proc. SPIE. 4562, 21st Annual BACUS Symposium on Photomask Technology
KEYWORDS: Refractive index, Phase shifting, Optical properties, Etching, Argon, Metals, Inspection, Chromium, Transmittance, Aluminum

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