Dr. Evan L. Schwartz
Graduate Research Assistant/PhD Candidate at Cornell Univ
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Oxides, Lithography, Electron beam lithography, Refractive index, Nanoparticles, Etching, Resistance, Photoresist materials, Extreme ultraviolet lithography, Hafnium

PROCEEDINGS ARTICLE | March 26, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Optical lithography, Scattering, Etching, Polymers, Annealing, Resistance, Transmission electron microscopy, Photoresist materials, Polymer thin films

PROCEEDINGS ARTICLE | March 26, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Oxides, Electron beam lithography, Refractive index, Deep ultraviolet, Nanoparticles, Etching, Resistance, Photoresist materials, Hafnium, Photoresist developing

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Near ultraviolet, Optical lithography, Molecules, Manufacturing, Xenon, Absorbance, Semiconducting wafers, 193nm lithography, Absorption

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