Dr. Evert C. Mos
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 20 March 2019
Proc. SPIE. 10961, Optical Microlithography XXXII
KEYWORDS: Metrology, Logic, Sensors, Scanners, Distortion, Process control, Optical alignment, Semiconducting wafers, Overlay metrology, Lithographic process control

Proceedings Article | 25 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Target detection, Metrology, Lithium, Scanners, Time metrology, Process control, Optical alignment, Semiconducting wafers, Overlay metrology, Process modeling

SPIE Journal Paper | 1 October 2011
JM3 Vol. 10 Issue 04
KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Lithography, Metrology, Inspection, Scanners, Optimization (mathematics), Double patterning technology, Wavefronts

Proceedings Article | 20 April 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Lithography, Metrology, Scanners, Inspection, Wavefronts, Photomasks, Double patterning technology, Critical dimension metrology, Optimization (mathematics), Semiconducting wafers

Proceedings Article | 29 March 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Lithography, Metrology, Optical lithography, Scanners, Time metrology, Process control, Feedback control, Semiconducting wafers, Overlay metrology, Tin

Proceedings Article | 17 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Metrology, Optical lithography, Etching, Scanners, Scanning electron microscopy, Scatterometry, Process control, Critical dimension metrology, Semiconducting wafers

Showing 5 of 10 publications
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