Prof. Eytan Barouch
at Boston Univ
SPIE Involvement:
Publications (52)

Proceedings Article | 28 April 2023 Paper
Proceedings Volume 12494, 124940K (2023)
KEYWORDS: Binary data, Interpolation, Extreme ultraviolet, Matrices, Semiconducting wafers, Nanoimprint lithography, Diffraction, Computer programming, Mathematical optimization, Source mask optimization

Proceedings Article | 26 March 2019 Paper
Proceedings Volume 10957, 109571D (2019)
KEYWORDS: Deep ultraviolet, Extreme ultraviolet lithography, Finite-difference time-domain method, Extreme ultraviolet, Computer simulations, Lithography, Computational electromagnetics

Proceedings Article | 24 March 2017 Paper
Proceedings Volume 10143, 101431P (2017)
KEYWORDS: Extreme ultraviolet lithography, Critical dimension metrology, Optical lithography, Optical proximity correction, EUV optics, Photomasks, Wafer-level optics, Reflectivity, Semiconducting wafers, Extreme ultraviolet

Proceedings Article | 26 September 2016 Paper
Proceedings Volume 9985, 99850G (2016)
KEYWORDS: Pellicles, Extreme ultraviolet, Optical lithography, Critical dimension metrology, Extreme ultraviolet lithography, Photomasks, Lead, Lithography, Contamination, Neodymium

SPIE Journal Paper | 1 August 2016
JM3, Vol. 15, Issue 03, 033504, (August 2016)
KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Optical lithography, Extreme ultraviolet lithography, Reflectivity, Imaging systems, Logic, Semiconductors, Applied physics

Showing 5 of 52 publications
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