Prof. Eytan Barouch
at Boston Univ
SPIE Involvement:
Author
Publications (51)

Proceedings Article | 26 March 2019 Paper
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Lithography, Finite-difference time-domain method, Deep ultraviolet, Computer simulations, Extreme ultraviolet, Extreme ultraviolet lithography, Computational electromagnetics

Proceedings Article | 24 March 2017 Paper
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Wafer-level optics, Optical lithography, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, EUV optics

Proceedings Article | 26 September 2016 Paper
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Lithography, Optical lithography, Contamination, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Neodymium, Lead

SPIE Journal Paper | 1 August 2016
JM3 Vol. 15 Issue 03
KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Optical lithography, Extreme ultraviolet lithography, Reflectivity, Imaging systems, Logic, Semiconductors, Applied physics

Proceedings Article | 18 March 2016 Paper
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Lithography, Lithographic illumination, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Lead

Showing 5 of 51 publications
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