Dr. Ezequiel Vidal-Russell
Sr Director Mask Technology at Micron Technology Inc
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 7 October 2020 Presentation + Paper
Proc. SPIE. 11518, Photomask Technology 2020

Proceedings Article | 3 October 2019 Paper
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Semiconductors, Semiconductors, Lithography, Lithography, Manufacturing, Manufacturing, Physics, Physics, Photomasks, Extreme ultraviolet, Extreme ultraviolet, Semiconductor manufacturing, Semiconductor manufacturing, Optical proximity correction, Optical proximity correction, Semiconducting wafers, Semiconducting wafers, Vestigial sideband modulation, Vestigial sideband modulation

Proceedings Article | 18 April 2013 Paper
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Reticles, Metrology, Data modeling, Manufacturing, Feature extraction, Scanning electron microscopy, Dysprosium, Optical proximity correction, Semiconducting wafers, Data analysis

Proceedings Article | 25 September 2010 Paper
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Optical lithography, Data modeling, Calibration, Etching, Signal processing, Photomasks, Optical proximity correction, Photoresist processing, Semiconducting wafers, Process modeling

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