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Fan Hsuan Hsu
at Powerchip Semiconductor Manufacturing Corp
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Publications (1)
Proceedings Article | 24 March 2017 Paper
Advanced application of pattern-aware OPC
James Chen, Shin-Shing Yeh, Alan Zhu, Bayram Yenikaya, Fan-Hsuan Hsu, Yung-Ching Mai, Lawrence Lin, Nelson Lai
Proceedings Volume 10147, 101471W (2017) https://doi.org/10.1117/12.2258331
KEYWORDS: Optical proximity correction, Resolution enhancement technologies, Model-based design, SRAF, Lithography, Process control, Computational lithography, Pattern recognition, Yield improvement, 193nm lithography, Optical lithography
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