Dr. Frederic Lazzarino
at imec
SPIE Involvement:
Author
Publications (25)

Proceedings Article | 12 May 2020
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Etching, Metals, Resistance, Transmission electron microscopy, Scatterometry, Photomasks, Machine learning, Line edge roughness, Semiconducting wafers, Ruthenium

Proceedings Article | 23 March 2020
Proc. SPIE. 11329, Advanced Etch Technology for Nanopatterning IX
KEYWORDS: Optical lithography, Fin field effect transistors, Etching, Dry etching, Gallium arsenide, Silicon, Field effect transistors, Plasma etching, Front end of line, Nanowires

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Edge detection, Metrology, Optical lithography, Image processing, Scanning electron microscopy, Transmission electron microscopy, Ion beams, Line width roughness, Semiconducting wafers

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Optical lithography, Statistical analysis, Image processing, Image analysis, Atomic force microscopy, Scanning electron microscopy, Signal processing, Algorithm development, Photoresist processing

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Optical lithography, Etching, Image processing, Image analysis, Scanning electron microscopy, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Failure analysis

Showing 5 of 25 publications
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