Dr. Fabian C. Martinez
at Intel Corp
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 23 March 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Electron beam lithography, Silica, Inspection, Atomic force microscopy, Scanning electron microscopy, Precision measurement, Photomasks, Extreme ultraviolet lithography, Optical alignment, Defect inspection

Proceedings Article | 18 March 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Thin films, Photovoltaics, Reticles, Data modeling, Error analysis, Distortion, Image registration, Finite element methods, Photomasks, Extreme ultraviolet

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Thin films, Reticles, Metrology, Distortion, Image registration, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Thin film deposition, Personal protective equipment

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