Dr. Fan Jiang
Production Manager at Siemens EDA
SPIE Involvement:
Publications (29)

Proceedings Article | 22 November 2023 Presentation
Proceedings Volume PC12751, PC127510Q (2023) https://doi.org/10.1117/12.2687822
KEYWORDS: Optical proximity correction, Photomasks, Extreme ultraviolet, Calibration, Semiconducting wafers, Scanning electron microscopy, Printing, Modeling, Machine learning, Data modeling

Proceedings Article | 21 November 2023 Presentation + Paper
Lianghong Yin, Marko Chew, Shumay Shang, Le Hong, Fan Jiang, Ilhami Torunoglu
Proceedings Volume 12751, 127510W (2023) https://doi.org/10.1117/12.2687752
KEYWORDS: Optical proximity correction, Image classification, Design and modelling, Machine learning, Data modeling, Critical dimension metrology, Tunable filters, Scanning electron microscopy, Inspection

Proceedings Article | 30 April 2023 Presentation
Le Hong, Fan Jiang, Yuansheng Ma, Srividya Jayaram, Joe Kwan, Haizhou Yin, Xiaoyuan Qi, Junjiang Lei
Proceedings Volume 12495, 124950G (2023) https://doi.org/10.1117/12.2658652
KEYWORDS: Manufacturing, Optical proximity correction, Failure analysis, Design for manufacturability, Analytics, Semiconductors, Semiconducting wafers, Metrology, Inspection, Design for manufacturing

Proceedings Article | 28 April 2023 Presentation + Paper
Proceedings Volume 12495, 1249518 (2023) https://doi.org/10.1117/12.2658322
KEYWORDS: Data modeling, Process modeling, Machine learning, Optical proximity correction, Statistical modeling, Calibration, Instrument modeling, Metrology, Design and modelling, Resolution enhancement technologies

Proceedings Article | 13 June 2022 Presentation
Proceedings Volume 12052, 120520V (2022) https://doi.org/10.1117/12.2619416
KEYWORDS: Photomasks, Machine learning, Optical proximity correction, Lithography, Semiconducting wafers, Fluctuations and noise, Visualization, Vestigial sideband modulation, Vector spaces, Product engineering

Showing 5 of 29 publications
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