Dr. Fan Jiang
Production Engineer at Mentor, a Siemens Business
SPIE Involvement:
Author
Publications (21)

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11329, Advanced Etch Technology for Nanopatterning IX
KEYWORDS: Data modeling, Etching, Inspection, Neural networks, Photomasks, Machine learning, Optical proximity correction, Semiconducting wafers, Process modeling

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Lithography, Image quality, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, SRAF

Proceedings Article | 2 January 2019 Presentation + Paper
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Lithography, Logic, Image processing, Photomasks, Extreme ultraviolet, Image enhancement, Source mask optimization, SRAF, Tantalum, Resolution enhancement technologies

Proceedings Article | 22 October 2018 Presentation + Paper
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Lithography, Image processing, Manufacturing, Printing, Image quality, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Vestigial sideband modulation

SPIE Journal Paper | 31 July 2018
JM3 Vol. 18 Issue 01
KEYWORDS: SRAF, Photomasks, Metals, Extreme ultraviolet lithography, Personal protective equipment, Photovoltaics, Extreme ultraviolet, Image quality, Source mask optimization, Lithography

Showing 5 of 21 publications
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