Dr. Fan Tu
at Carl Zeiss SMT GmbH
SPIE Involvement:
Author
Publications (3)

SPIE Journal Paper | 7 September 2021 Open Access
Tilmann Heil, Michael Waldow, Renzo Capelli, Horst Schneider, Laura Ahmels, Fan Tu, Johannes Schöneberg, Hubertus Marbach
JM3, Vol. 20, Issue 03, 031013, (September 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.3.031013
KEYWORDS: Photomasks, Extreme ultraviolet, Critical dimension metrology, Scanning electron microscopy, Extreme ultraviolet lithography, Scanners, Image processing, Cadmium, Manufacturing, Image analysis

Proceedings Article | 6 October 2020 Presentation + Paper
Horst Schneider, Fan Tu, Laura Ahmels, Bartholomaeus Szafranek, Katharina Gries, Daniel Rhinow, Sebastian Vollmar, Andreas Krugmann, Ralf Schoenberger, Walter Pauls, Andreas Verch, Renzo Capelli, Alice Vincenzo, Grizelda Kersteen, Hubertus Marbach, Michael Waldow
Proceedings Volume 11518, 1151808 (2020) https://doi.org/10.1117/12.2572879
KEYWORDS: Extreme ultraviolet, Photomasks, Electron beams, Scanning electron microscopy, Semiconductors, Manufacturing, Extreme ultraviolet lithography, Lithography, Double patterning technology, Deep ultraviolet

Proceedings Article | 26 September 2019 Presentation + Paper
Kokila Egodage, Fan Tu, Horst Schneider, Christian Hermanns, Grizelda Kersteen, Bartholomaeus Szafranek, Kristian Schulz
Proceedings Volume 11147, 111471G (2019) https://doi.org/10.1117/12.2538474
KEYWORDS: Photomasks, Extreme ultraviolet, Scanning electron microscopy, Extreme ultraviolet lithography, Manufacturing, Back end of line, Image analysis, Semiconductors, Multilayers, Scanners

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