Dr. Fan Wang
at Shanghai Institute of Optics and Fine Mechanics
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | May 19, 2006
Proc. SPIE. 6150, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment
KEYWORDS: Lithography, Monochromatic aberrations, Optical lithography, Fluctuations and noise, Coherence (optics), Optical testing, Ray tracing, Projection systems, Optical alignment, Semiconducting wafers

PROCEEDINGS ARTICLE | January 27, 2005
Proc. SPIE. 5645, Advanced Microlithography Technologies
KEYWORDS: Lithography, Monochromatic aberrations, Imaging systems, Adaptive optics, Artificial neural networks, Neural networks, Optical alignment, Semiconducting wafers, Evolutionary algorithms, Neurons

PROCEEDINGS ARTICLE | January 27, 2005
Proc. SPIE. 5645, Advanced Microlithography Technologies
KEYWORDS: Lithography, Monochromatic aberrations, Optical lithography, Calibration, Adaptive optics, Image quality, Line width roughness, Optical alignment, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | January 27, 2005
Proc. SPIE. 5645, Advanced Microlithography Technologies
KEYWORDS: Diffraction, Monochromatic aberrations, Phase shifting, Coherence (optics), Wavefronts, Image sensors, Photomasks, Semiconducting wafers, Binary data, Resolution enhancement technologies

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