Faran Nouri
Technology Director at Applied Materials Inc
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 18 August 2000
Proc. SPIE. 4181, Challenges in Process Integration and Device Technology
KEYWORDS: Etching, Metals, Copper, Reliability, Resistance, Signal processing, Aluminum, Semiconducting wafers, Wafer testing, Temperature metrology

Proceedings Article | 1 September 1999
Proc. SPIE. 3881, Microelectronic Device Technology III
KEYWORDS: Oxides, Etching, Annealing, Silicon, Hydrogen, Diffusion, Capacitance, Thermal oxidation, Chemical mechanical planarization, Oxidation

Proceedings Article | 1 September 1999
Proc. SPIE. 3881, Microelectronic Device Technology III
KEYWORDS: Oxides, Etching, Interfaces, Diffusion, Doping, Control systems, Measurement devices, Boron, Transistors, CMOS technology

Proceedings Article | 4 September 1998
Proc. SPIE. 3506, Microelectronic Device Technology II
KEYWORDS: Oxides, Polishing, Etching, Silicon, Diodes, Transistors, Semiconducting wafers, Plasma, Chemical mechanical planarization, Oxidation

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