Farhad H. Salmassi
Lab Director at Lawrence Berkeley National Lab
SPIE Involvement:
Author
Publications (25)

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Mirrors, Scanners, Semiconducting wafers, Scanning electron microscopy, Camera shutters, Image processing, Vibration isolation, Projection systems

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Scanning electron microscopy, Critical dimension metrology, Semiconducting wafers, Extreme ultraviolet lithography, Optical lithography, Monochromatic aberrations, Line width roughness, Photoresist materials, Image processing, Projection systems

Proceedings Article | 16 October 2017 Presentation
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Extreme ultraviolet, Molybdenum, Silicon, Atomic layer deposition, Optical components, Phase shifts, Structural engineering, Electron beam lithography, Optical design, Reflection

Proceedings Article | 15 September 2016 Presentation + Paper
Proc. SPIE. 9963, Advances in X-Ray/EUV Optics and Components XI
KEYWORDS: Diffraction gratings, Diffraction, X-rays, X-ray diffraction, Etching, Extreme ultraviolet lithography, Monochromators, Plasma etching, Wet etching, Direct write lithography

SPIE Journal Paper | 12 July 2016
JM3 Vol. 15 Issue 03
KEYWORDS: Photomasks, Extreme ultraviolet, Microscopes, Extreme ultraviolet lithography, Semiconducting wafers, Scanners, Modulation, Multilayers, Fiber optic illuminators, Nickel

Showing 5 of 25 publications
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