Farhad H. Salmassi
Lab Director at Lawrence Berkeley National Lab
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Author
Publications (24)

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Monochromatic aberrations, Optical lithography, Image processing, Scanning electron microscopy, Photoresist materials, Projection systems, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 16 October 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Optical components, Electron beam lithography, Optical design, Reflection, Silicon, Atomic layer deposition, Extreme ultraviolet, Molybdenum, Structural engineering, Phase shifts

Proceedings Article | 15 September 2016
Proc. SPIE. 9963, Advances in X-Ray/EUV Optics and Components XI
KEYWORDS: Diffraction, Etching, X-rays, X-ray diffraction, Wet etching, Plasma etching, Extreme ultraviolet lithography, Monochromators, Direct write lithography, Diffraction gratings

SPIE Journal Paper | 12 July 2016
JM3 Vol. 15 Issue 03
KEYWORDS: Photomasks, Extreme ultraviolet, Microscopes, Extreme ultraviolet lithography, Semiconducting wafers, Scanners, Modulation, Multilayers, Fiber optic illuminators, Nickel

Proceedings Article | 10 May 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Microscopes, Multilayers, Optical lithography, Etching, Chromium, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Phase shifts

Showing 5 of 24 publications
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