Farid Sebaai
at imec
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 20 March 2019 Paper
Proc. SPIE. 10963, Advanced Etch Technology for Nanopatterning VIII
KEYWORDS: Optical lithography, Etching, Polymers, Dielectrics, Silicon, Plasma etching, Silicon carbide, Fluorine, Polymer thin films, Plasma

Proceedings Article | 20 March 2019 Paper
Proc. SPIE. 10963, Advanced Etch Technology for Nanopatterning VIII
KEYWORDS: Fin field effect transistors, Germanium, Gallium arsenide, Gallium nitride, Field effect transistors, CMOS technology, Group III-V semiconductors

Proceedings Article | 7 April 2017 Paper
Proc. SPIE. 10149, Advanced Etch Technology for Nanopatterning VI
KEYWORDS: Oxides, Optical lithography, Contamination, Etching, Metals, Silicon, Reflectivity, Photomasks, System on a chip, Plasma

Proceedings Article | 27 March 2017 Presentation + Paper
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Carbon, Lithography, Optical lithography, Etching, Silicon, Photoresist materials, Photomasks, System on a chip, Front end of line

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top