Dr. Fedor Trintchouk
System Scientist at Singular Genomics Systems
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | March 16, 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Light sources, Deep ultraviolet, Modulation, Polarization, Scanners, Laser stabilization, Double patterning technology, Immersion lithography, High volume manufacturing

SPIE Journal Paper | July 1, 2008
JM3 Vol. 7 Issue 03
KEYWORDS: Critical dimension metrology, Optical simulations, Laser scanners, 3D scanning, Laser stabilization, Scanners, Convolution, Semiconducting wafers, Laser metrology, Laser damage threshold

PROCEEDINGS ARTICLE | March 17, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Light sources, Scanners, Control systems, Laser scanners, Excimer lasers, Double patterning technology, Immersion lithography, 3D scanning, Semiconducting wafers, Pulsed laser operation

PROCEEDINGS ARTICLE | March 15, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Actuators, Light sources, Metrology, Deep ultraviolet, Imaging systems, Control systems, Laser stabilization, Optical proximity correction, Molybdenum, Fluorine

PROCEEDINGS ARTICLE | March 15, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Light sources, Metrology, Polarization, Scanners, Spectroscopy, Manufacturing, Control systems, Immersion lithography, Acoustics, Pulsed laser operation

PROCEEDINGS ARTICLE | May 12, 2004
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Light sources, Polarization, Birefringence, Spectroscopy, Gas lasers, Immersion lithography, Molybdenum, Fluorine, Pulsed laser operation, Beam controllers

Showing 5 of 7 publications
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