Dr. Fei Liu
at ASML
SPIE Involvement:
Author
Area of Expertise:
Laser physics , Plasma physics , Optics
Profile Summary

Fei Liu received his Ph.D. from University of California-Davis in 2013. His PhD research is on design and development of 100MW peak power TEA CO2 lasers. Afterwards he joined ASML research department working on feasibility study of alternative architecture of Laser Produced Plasma (LPP) EUV source. His current research interest is high-NA EUV machine integral system performance optimization. He received Richard Snavely Memorial Award in 2009.
Publications (1)

Proceedings Article | 23 March 2020
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Reticles, Deep ultraviolet, Imaging systems, Scanners, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography

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