Dr. Fei Liu
at ASML
SPIE Involvement:
Author
Area of Expertise:
Laser physics , Plasma physics , Optics
Profile Summary

Fei Liu received his Ph.D. from University of California-Davis in 2013. His PhD research is on design and development of 100MW peak power TEA CO2 lasers. Afterwards he joined ASML research department working on feasibility study of alternative architecture of Laser Produced Plasma (LPP) EUV source. His current research interest is high-NA EUV machine integral system performance optimization. He received Richard Snavely Memorial Award in 2009.
Publications (4)

Proceedings Article | 16 October 2020 Presentation + Paper
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Microscopes, Light sources, Reticles, Optical lithography, Scanners, Projection systems, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Fiber optic illuminators

SPIE Journal Paper | 22 September 2020
JM3 Vol. 19 Issue 03

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Reticles, Deep ultraviolet, Imaging systems, Scanners, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography

SPIE Journal Paper | 22 April 2013
OE Vol. 52 Issue 04
KEYWORDS: Gas lasers, Carbon monoxide, Pulsed laser operation, Optical simulations, Laser resonators, Laser applications, Output couplers, Atmospheric optics, Solar energy, Reflectivity

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