Dr. Fei Zhang
at Institute of Electrical Engineering
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 9 June 2006
Proc. SPIE. 6149, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Polarization, Image processing, Photomasks, Sodium, Critical dimension metrology, Resolution enhancement technologies, Phase shifts

Proceedings Article | 1 February 2006
Proc. SPIE. 6034, ICO20: Optical Design and Fabrication
KEYWORDS: Semiconductors, Lithography, Monochromatic aberrations, Lithium, Lithographic illumination, Polarization, Image quality, Immersion lithography, Electrical engineering, Spherical lenses

Proceedings Article | 28 June 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Lithography, Optical lithography, Polarization, Image processing, Photomasks, Immersion lithography, Nanoimprint lithography, Critical dimension metrology, Polarization control, Tolerancing

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