Mr. Felix Koch Profile

Felix Koch

Engineer at Carl Zeiss Jena GmbH

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Publications (6)

Proceedings Article | 12 July 2019

Tailored dispersive elements for adapted spectrometric sensing

Torsten Diehl, Peter Triebel, Tobias Moeller, Alexandre Gatto, Dennis Lehr, Alexander Pesch, Lars Erdmann, Matthias Burkhardt, Alexander Kalies, Felix Koch

Proc. SPIE. 11180, International Conference on Space Optics — ICSO 2018

KEYWORDS: Optical design, Holography, Interferometers, Spectroscopy, Spectrometers, Manufacturing, Wavefronts, Photoresist materials, Optics manufacturing, Diffraction gratings

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Proceedings Article | 21 June 2019 Paper

High-resolution Czerny-Turner scatterometer for BRDF measurements

Felix Koch, Matthias Zilk, Mike Schnabel, Tilman Glaser

Proc. SPIE. 11056, Optical Measurement Systems for Industrial Inspection XI

KEYWORDS: Scattering, Light scattering, Bidirectional reflectance transmission function, Diffraction gratings

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SPIE Journal Paper | 24 May 2019

Reactive ion beam etching of highly dispersive, high-efficiency transmission gratings for the VIS range

Annemarie Finzel, Felix Koch, Gregor Dornberg, Dennis Lehr, Frank Frost, Tilman Glaser

OE Vol. 58 Issue 09

KEYWORDS: Etching, Diffraction gratings, Ions, Diffraction, Ion beams, Reactive ion etching, Refractive index, Photoresist materials, Silica, Oxygen

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Proceedings Article | 15 June 2018 Paper

Optical gratings with low wavefront aberrations and low straylight for enhanced spectroscopical applications

Torsten Diehl, Peter Triebel, Tobias Moeller, Alexandre Gatto, Dennis Lehr, Alexander Pesch, Lars Erdmann, Matthias Burkhardt, Alexander Kalies, Felix Koch

Proc. SPIE. 10692, Optical Fabrication, Testing, and Metrology VI

KEYWORDS: Optical components, Optical design, Holography, Satellites, Spectrometers, Manufacturing, Wavefront aberrations, Photoresist materials, Optics manufacturing, Diffraction gratings

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The sensing performance of spectroscopic systems can be enhanced by improving their optical core-element: the optical grating. in particular for imaging spectrometers - especially Hyper-Spectral Imagers - beside the polarization sensitivity and efficiency the imaging quality of the diffraction grating is an important parameter. Optical elements within the spectrometer are manufactured while aiming on lowest wave front aberrations. Thus, least imaging aberration quality of the grating is required not to limit the overall imaging quality of the instrument. Different types of spectrometers (Offner, Czerny Turner) lead to different requirements for the grating surface figure. Beside wavefront aberrations the straylight of gratings will impact the optical performance of spectrometers too. Both parameters are crucially influenced by the manufacturing processes. During the manufacturing process of the grating substrate, a sequence of polishing steps can be applied in order to minimize the wavefront aberrations and roughness. Chemical assisted polishing in combination with classical techniques lead to least surface roughness. A good practice for the manufacturing of aspheres and freeform substrates is the generation of an initial figure close to the final shape only by a classical process, followed by a careful applied aspherization. The imaging performance (wavefront and straylight) of the grating is also optimized due to the recording setup of the holography - including all employed optics for the wave forming. Holographically manufactured gratings with adapted wave forming functions are used for transmission or reflection gratings on different types of substrates like prisms, convex and concave spherical and aspherical surface shapes, up to free-form elements. Numerous spectrometer setups (e.g. Offner, Rowland circle, Czerny-Turner system layout) work on the optical design principles of reflection gratings. All those manufactured gratings can be coated with adapted coatings to support their reflection or transmission operation. The present approach can be applied to manufacture high quality reflection gratings for the EUV to the IR. In this paper we report our results on designing and manufacturing high quality gratings based on holographic processes in order to enable diffraction limited complex spectrometric setups over certain wavelength ranges. Most beneficial is an optimization of the grating during spectrometer design phase while regarding the manufacturing as well. However, the initial optical design approach will show that gratings can be tailored to the specific requirements of the spectrometer (in order to enhance the imaging quality). The enhancement of the optical performance may lead to a specific wavefront shape after the grating element. this special capability for aberration reduction can be defined to the grating during the holographic process. In general, holography enables to manufacture gratings with a specific and adapted wavefront error compensation functions. Beside the results of low aberration gratings the results on straylight measurements will be presented. Recent results and optimization will be shown.

Proceedings Article | 28 May 2018 Paper

Optimization and tolerancing of highly dispersive multilayer gratings for laser applications

Felix Koch, Dennis Lehr, Tilman Glaser

Proc. SPIE. 10694, Computational Optics II

KEYWORDS: Diffraction, Refractive index, Optical design, Multilayers, Reflection, Dielectrics, Tantalum, Optimization (mathematics), Tolerancing, Diffraction gratings

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Proceedings Article | 16 October 2017 Paper

Stability requirements for two-beam interference lithography diffraction grating manufacturing

Felix Koch, Dennis Lehr, Tilman Glaser

Proc. SPIE. 10448, Optifab 2017

KEYWORDS: Lithography, Holography, Manufacturing, Humidity, Laser stabilization, Laser optics, Optics manufacturing, Atmospheric optics, Temperature metrology, Diffraction gratings

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Showing 5 of 6 publications

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