Dr. Felix Wahlisch Profile

Dr. Felix Wahlisch

at ASML Netherlands BV

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Author

Publications (6)

Proceedings Article | 23 March 2020 Paper

Spectral purity performance of high-power EUV systems

Mark van de Kerkhof, Fei Liu, Marieke Meeuwissen, Xueqing Zhang, Robert de Kruif, Natalia Davydova, Guido Schiffelers, Felix Wählisch, Eelco van Setten, Wouter Varenkamp, Kees Ricken, Laurens de Winter, John McNamara, Muharrem Bayraktar

Proceedings Volume 11323, 1132321 (2020) https://doi.org/10.1117/12.2551021

KEYWORDS: Extreme ultraviolet, Deep ultraviolet, Extreme ultraviolet lithography, Reflectivity, Reticles, Imaging systems, Scanners

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Proceedings Article | 9 October 2019 Presentation + Paper

Particle on EUV pellicles, impact on LWR

Michiel Kupers, Gijsbert Rispens, Lokesh Devaraj, Gerardo Bottiglieri, Twan van den Hoogenhoff, Par Broman, Andreas Erdmann, Felix Wahlisch

Proceedings Volume 11147, 111470S (2019) https://doi.org/10.1117/12.2537103

KEYWORDS: Particles, Line width roughness, Pellicles, Semiconducting wafers, Extreme ultraviolet, Reticles, Scanners, Extreme ultraviolet lithography, Photomasks

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Proceedings Article | 26 September 2019 Presentation + Paper

Improving exposure latitudes and aligning best focus through pitch by curing M3D phase effects with controlled aberrations

Joern-Holger Franke, Joost Bekaert, Victor Blanco, Lieve Van Look, Felix Wahlisch, Kateryna Lyakhova, Paul van Adrichem, Mark Maslow, Guido Schiffelers, Eric Hendrickx

Proceedings Volume 11147, 111470E (2019) https://doi.org/10.1117/12.2537104

KEYWORDS: Diffraction, Extreme ultraviolet lithography, Metals, Photomasks, Semiconducting wafers, Nanoimprint lithography, Optical proximity correction, Extreme ultraviolet, Phase modulation, Phase shift keying

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Proceedings Article | 29 August 2019 Paper

Progress in imaging performance with EUV pellicles

O. Romanets, K. Ricken, M. Kupers, F. Wählisch, C. Piliego, P. Broman, D. de Graaf

Proceedings Volume 11177, 111770Z (2019) https://doi.org/10.1117/12.2535675

KEYWORDS: Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Reflectivity, Line width roughness

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Proceedings Article | 29 August 2019 Paper

Lithographic effects due to particles on high-NA EUV mask pellicle

Lokesh Devaraj, Gerardo Bottiglieri, Andreas Erdmann, Felix Wählisch, Michiel Kupers, Eelco van Setten, Timon Fliervoet

Proceedings Volume 11177, 111770V (2019) https://doi.org/10.1117/12.2534177

KEYWORDS: Particles, Pellicles, Photomasks, Phase shifts, Extreme ultraviolet, Scanners, Nanoimprint lithography, Extreme ultraviolet lithography, Reticles

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Proceedings Article | 26 March 2019 Presentation + Paper

Impact of local variability on defect-aware process windows

Mark John Maslow, Hidetami Yaegashi, Andreas Frommhold, Guido Schiffelers, Felix Wahlisch, Gijsbert Rispens, Bram Slachter, Keisuke Yoshida, Arisa Hara, Noriaki Oikawa, Abhinav Pathak, Dorin Cerbu, Eric Hendrickx, Joost Bekaert

Proceedings Volume 10957, 109570H (2019) https://doi.org/10.1117/12.2514719

KEYWORDS: Critical dimension metrology, Etching, Metrology, Lithography, Semiconducting wafers, Photoresist processing, Statistical analysis, Optical lithography, Stochastic processes

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Showing 5 of 6 publications

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