Mr. Fen-Shuo Chen Profile

Fen-Shuo Chen

Plant Manager at Toppan Chunghwa Electronics Co Ltd

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Author

Publications (7)

Proceedings Article | 11 May 2009 Paper

Reduction of MRC error review time through the simplified and classified MRC result

Jason Lin, Frank Chen, Casper Lee

Proceedings Volume 7379, 73790X (2009) https://doi.org/10.1117/12.824274

KEYWORDS: Lithium, Databases, Error analysis, Inspection, Photomasks, Mask making, Cesium, Semiconducting wafers, Current controlled current source

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Proceedings Article | 11 May 2007 Paper

Influence of environmental components on haze growth

John Keagy, Kyoko Kuroki, Takahiro Matsuura, Joseph Gordon, Steve Mahoney, Frank Chen, Makoto Kozuma, Christian Chovino, Larry Frisa, Colleen Weins, David Chan

Proceedings Volume 6607, 660707 (2007) https://doi.org/10.1117/12.728920

KEYWORDS: Semiconductors, Reticles, Air contamination, Gases, Sulfur, Nitrogen, Pellicles, Photomasks, Semiconducting wafers, Atmospheric particles

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Proceedings Article | 20 October 2006 Paper

Non-chemical cleaning technology for sub-90nm design node photomask manufacturing

Torey Huang, Makoto Kozuma, Star Hoyeh, Richard Chen, Joann Kuo, Frank Chen

Proceedings Volume 6349, 63492U (2006) https://doi.org/10.1117/12.686075

KEYWORDS: Particles, Ions, Hydrogen, Manufacturing, Reflectivity, Photomasks, Scanning probe microscopy, Ozone, Photoresist processing, Plasma

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Proceedings Article | 20 October 2006 Paper

Incoming database verification and management for mask data preparation

Jason Lin, Casper Lee, Frank Chen

Proceedings Volume 6349, 63493U (2006) https://doi.org/10.1117/12.685916

KEYWORDS: Lithium, Data storage, Databases, Manufacturing, Computing systems, Data archive systems, Photomasks, Computed tomography, Error control coding, Data storage servers

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Proceedings Article | 20 October 2006 Paper

Study of chromeless mask quartz defect detection capability for 80-nm post structure

Frank Chen, Jomarch Chou, Orion Wang, Boster Wang, Jackie Cheng, Jerry Lu, Orson Lin, Paul Yu, Ellison Chen

Proceedings Volume 6349, 63493K (2006) https://doi.org/10.1117/12.685660

KEYWORDS: Lithography, Reticles, Defect detection, Quartz, Manufacturing, Inspection, Chromium, Photomasks, Semiconducting wafers, Resolution enhancement technologies

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Proceedings Article | 5 July 2000 Paper

Optical holography used in optical microlithography

Desheng Hou, Jin Zhang, Fen Chen, Boru Feng

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389082

KEYWORDS: Diffraction, Holograms, Holography, Optical lithography, 3D image reconstruction, Imaging systems, Image resolution, Microelectronics, Photomasks, Semiconducting wafers

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Proceedings Article | 5 July 2000 Paper

Simpler attenuated phase-shifting mask

Fang Sun, Boru Feng, Fen Chen, Chongxi Zhou, Jin Zhang, Yongkang Guo, Ping Su, HanMin Yao, Desheng Hou

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388954

KEYWORDS: Electronics, Etching, Manufacturing, Chromium, Scanning electron microscopy, Transmittance, Photomasks, Mask making, Optics manufacturing, Phase shifts

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Showing 5 of 7 publications

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