Prof. Feng Shao
at Fraunhofer-IISB
SPIE Involvement:
Author
Publications (16)

SPIE Journal Paper | 1 March 2013
JM3 Vol. 12 Issue 02
KEYWORDS: Extreme ultraviolet, Computer simulations, Waveguides, Photomasks, Diffraction, Multilayers, Data modeling, Matrices, Electromagnetism, Finite-difference time-domain method

Proceedings Article | 8 November 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Diffraction, Waveguides, Data storage, Ions, Computer simulations, Photomasks, Extreme ultraviolet, Cadmium sulfide, Neodymium, Polonium

Proceedings Article | 5 October 2011
Proc. SPIE. 8171, Physical Optics
KEYWORDS: Lithography, Data modeling, Calibration, Diffusion, Photoresist materials, Projection systems, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Diffraction, Monochromatic aberrations, Imaging systems, Wavefronts, Projection systems, Photomasks, Extreme ultraviolet, Semiconducting wafers, EUV optics

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Diffraction, Lithographic illumination, Polarization, 3D modeling, Projection systems, Photomasks, Performance modeling, Projection lithography, Systems modeling

Showing 5 of 16 publications
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