Fengnien Tsai
at Macronix International Co Ltd
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Lithography, Reticles, Optical lithography, Modulation, Photomasks, SRAF, Critical dimension metrology, Imaging arrays, Semiconducting wafers, Array processing

PROCEEDINGS ARTICLE | March 19, 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Lithography, Etching, Satellites, Polymers, Distortion, Photomasks, Double patterning technology, Photoresist processing, Semiconducting wafers, Defect inspection

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