Dr. Fernando A. Sigoli
R&D Manager at OptiNetrics Inc
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | May 28, 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Thin films, Lithography, Deep ultraviolet, Silica, Signal attenuation, Glasses, Ultraviolet radiation, Computer generated holography, Photomasks, Photomask technology

PROCEEDINGS ARTICLE | December 17, 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Thin films, Lithography, Optical lithography, Deep ultraviolet, Signal attenuation, Glasses, Ultraviolet radiation, Computer generated holography, Photomasks, Photomask technology

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