Dr. Fernando A. Sigoli
R&D Manager at OptiNetrics Inc
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 28 May 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Photomasks, Photomask technology, Deep ultraviolet, Lithography, Ultraviolet radiation, Computer generated holography, Signal attenuation, Glasses, Thin films, Silica

Proceedings Article | 17 December 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Photomasks, Photomask technology, Deep ultraviolet, Lithography, Ultraviolet radiation, Computer generated holography, Signal attenuation, Glasses, Thin films, Optical lithography

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