Filippo Belletti
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 20 March 2020 Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Metrology, Diffractive optical elements, Etching, Scanners, Optical testing, Optical metrology, Measurement devices, Semiconducting wafers, Wafer testing, Overlay metrology

Proceedings Article | 28 March 2017 Presentation + Paper
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Reticles, Metrology, Logic, Etching, Scanners, Manufacturing, Process control, Critical dimension metrology, Semiconducting wafers, Wafer testing

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