Firoz A. Ghadiali
Eng. Tech. Dev. Manager at Intel Corp
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 23 March 2021 Presentation + Paper
Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Defect detection, Deep ultraviolet, Inspection, Optical inspection, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, EUV optics

Proceedings Article | 19 May 2008 Paper
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Lithography, Reticles, Contamination, Defect detection, Inspection, Wafer inspection, Photomasks, Critical dimension metrology, Semiconducting wafers, Defect inspection

Proceedings Article | 20 May 2006 Paper
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Microscopes, Femtosecond phenomena, Deep ultraviolet, Electrons, Chromium, Laser ablation, Photomasks, Critical dimension metrology, Pulsed laser operation, Absorption

Proceedings Article | 15 March 2006 Paper
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Reticles, Logic, Optical lithography, Etching, Quartz, Manufacturing, Photomasks, Optical proximity correction, Critical dimension metrology, Phase shifts

Showing 5 of 7 publications
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