Mr. Firoz A. Ghadiali Profile

Firoz A. Ghadiali

Eng. Tech. Dev. Manager at Intel Corp

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Author

Publications (7)

Proceedings Article | 23 March 2021 Presentation + Paper

Laser-assisted discharge produced plasma (LDP) EUV source for actinic patterned mask inspection (APMI)

Safak Sayan, Kishore Chakravorty, Yusuke Teramoto, Takahiro Shirai, Shunichi Morimoto, Hidenori Watanabe, Yoshihiko Sato, Kazuya Aoki, Ted Liang, Yoshihiro Tezuka, Marieke Jager, Firoz Ghadiali, Frank Abboud, Steven Carson

Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII

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Proceedings Article | 23 March 2020 Paper

EUV mask infrastructure and actinic pattern mask inspection

Ted Liang, Yoshihiro Tezuka, Marieke Jager, Kishore Chakravorty, Safak Sayan, Eric Frendberg, Srinath Satyanarayana, Firoz Ghadiali, Guojing Zhang, Frank Abboud

Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI

KEYWORDS: Defect detection, Deep ultraviolet, Inspection, Optical inspection, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, EUV optics

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Proceedings Article | 19 May 2008 Paper

Wafer plane inspection for advanced reticle defects

Rajesh Nagpal, Firoz Ghadiali, Jun Kim, Tracy Huang, Song Pang

Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV

KEYWORDS: Lithography, Reticles, Contamination, Defect detection, Inspection, Wafer inspection, Photomasks, Critical dimension metrology, Semiconducting wafers, Defect inspection

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Proceedings Article | 20 May 2006 Paper

Femtopulse laser-based mask repair in the DUV wavelength regime

Firoz Ghadiali, Vikram Tolani, Rajesh Nagpal, Tod Robinson, Jeff LeClaire, Ron Bozak, David Lee, Roy White

Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII

KEYWORDS: Microscopes, Femtosecond phenomena, Deep ultraviolet, Electrons, Chromium, Laser ablation, Photomasks, Critical dimension metrology, Pulsed laser operation, Absorption

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Proceedings Article | 15 March 2006 Paper

Alt- phase-shift mask technology for 65nm logic applications

Kishore Chakravorty, Sven Henrichs, Wei Qiu, Joas Chavez, Yi-Ping Liu, Firoz Ghadiali, Karmen Yung, Nathan Wilcox, Mary Silva, Jian Ma, Ping Qu, Brian Irvine, Henry Yun, Wen-Hao Cheng, Jeff Farnsworth

Proc. SPIE. 6154, Optical Microlithography XIX

KEYWORDS: Reticles, Logic, Optical lithography, Etching, Quartz, Manufacturing, Photomasks, Optical proximity correction, Critical dimension metrology, Phase shifts

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Proceedings Article | 6 December 2004 Paper

DIVAS: fully automated simulation based mask defect dispositioning and defect management system

Saghir Munir, Daniel Bald, Vikram Tolani, Firoz Ghadiali, Barry Lieberman

Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology

KEYWORDS: Lithography, Databases, Image processing, Inspection, Computer simulations, Data archive systems, Photomasks, Critical dimension metrology, Semiconducting wafers, Defect inspection

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Proceedings Article | 2 July 2003 Paper

DIVAS: an integrated networked system for mask defect dispositioning and defect management

Saghir Munir, Dan Bald, Vikram Tolani, Firoz Ghadiali

Proc. SPIE. 5043, Cost and Performance in Integrated Circuit Creation

KEYWORDS: Defect detection, Databases, Inspection, Control systems, Computer simulations, Scanning electron microscopy, Photomasks, Semiconducting wafers, Classification systems, Defect inspection

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Showing 5 of 7 publications

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