Firoz A. Ghadiali
Eng. Tech. Dev. Manager at Intel Corp
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 19 May 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Lithography, Reticles, Contamination, Defect detection, Inspection, Wafer inspection, Photomasks, Critical dimension metrology, Semiconducting wafers, Defect inspection

Proceedings Article | 20 May 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Microscopes, Femtosecond phenomena, Deep ultraviolet, Electrons, Chromium, Laser ablation, Photomasks, Critical dimension metrology, Pulsed laser operation, Absorption

Proceedings Article | 15 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Reticles, Logic, Optical lithography, Etching, Quartz, Manufacturing, Photomasks, Optical proximity correction, Critical dimension metrology, Phase shifts

Proceedings Article | 6 December 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Databases, Image processing, Inspection, Computer simulations, Data archive systems, Photomasks, Critical dimension metrology, Semiconducting wafers, Defect inspection

Proceedings Article | 2 July 2003
Proc. SPIE. 5043, Cost and Performance in Integrated Circuit Creation
KEYWORDS: Defect detection, Databases, Inspection, Control systems, Computer simulations, Scanning electron microscopy, Photomasks, Semiconducting wafers, Classification systems, Defect inspection

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