Mr. Firoz A. Ghadiali Profile

Firoz A. Ghadiali

Eng. Tech. Dev. Manager at Intel Corp

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Author

Publications (5)

Proceedings Article | 19 May 2008

Wafer plane inspection for advanced reticle defects

Rajesh Nagpal, Firoz Ghadiali, Jun Kim, Tracy Huang, Song Pang

Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV

KEYWORDS: Lithography, Reticles, Contamination, Defect detection, Inspection, Wafer inspection, Photomasks, Critical dimension metrology, Semiconducting wafers, Defect inspection

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Proceedings Article | 20 May 2006

Femtopulse laser-based mask repair in the DUV wavelength regime

Firoz Ghadiali, Vikram Tolani, Rajesh Nagpal, Tod Robinson, Jeff LeClaire, Ron Bozak, David Lee, Roy White

Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII

KEYWORDS: Microscopes, Femtosecond phenomena, Deep ultraviolet, Electrons, Chromium, Laser ablation, Photomasks, Critical dimension metrology, Pulsed laser operation, Absorption

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Proceedings Article | 15 March 2006

Alt- phase-shift mask technology for 65nm logic applications

Kishore Chakravorty, Sven Henrichs, Wei Qiu, Joas Chavez, Yi-Ping Liu, Firoz Ghadiali, Karmen Yung, Nathan Wilcox, Mary Silva, Jian Ma, Ping Qu, Brian Irvine, Henry Yun, Wen-Hao Cheng, Jeff Farnsworth

Proc. SPIE. 6154, Optical Microlithography XIX

KEYWORDS: Reticles, Logic, Optical lithography, Etching, Quartz, Manufacturing, Photomasks, Optical proximity correction, Critical dimension metrology, Phase shifts

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Proceedings Article | 6 December 2004

DIVAS: fully automated simulation based mask defect dispositioning and defect management system

Saghir Munir, Daniel Bald, Vikram Tolani, Firoz Ghadiali, Barry Lieberman

Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology

KEYWORDS: Lithography, Databases, Image processing, Inspection, Computer simulations, Data archive systems, Photomasks, Critical dimension metrology, Semiconducting wafers, Defect inspection

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Proceedings Article | 2 July 2003

DIVAS: an integrated networked system for mask defect dispositioning and defect management

Saghir Munir, Dan Bald, Vikram Tolani, Firoz Ghadiali

Proc. SPIE. 5043, Cost and Performance in Integrated Circuit Creation

KEYWORDS: Defect detection, Databases, Inspection, Control systems, Computer simulations, Scanning electron microscopy, Photomasks, Semiconducting wafers, Classification systems, Defect inspection

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