Dr. Florian Delachat
at CEA-LETI
SPIE Involvement:
Author
Publications (10)

PROCEEDINGS ARTICLE | September 19, 2018
Proc. SPIE. 10775, 34th European Mask and Lithography Conference
KEYWORDS: Lithography, Data modeling, Calibration, Silicon, Coating, Manufacturing, Scanning electron microscopy, Nanoimprint lithography, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10588, Design-Process-Technology Co-optimization for Manufacturability XII
KEYWORDS: Metrology, Data modeling, Silicon, Coating, Manufacturing, Scanning electron microscopy, Nanoimprint lithography, Critical dimension metrology, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Optical lithography, 3D acquisition, Scattering, Etching, X-rays, 3D modeling, Directed self assembly, Integrated circuits

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Semiconductors, Oxides, Optical lithography, Silicon, Materials processing, Photomasks, Directed self assembly, Critical dimension metrology, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Etching, Ultraviolet radiation, Particles, Silicon, Manufacturing, Inspection, Scanning electron microscopy, Photomasks, Nanoimprint lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | April 10, 2017
Proc. SPIE. 10149, Advanced Etch Technology for Nanopatterning VI
KEYWORDS: Lithography, Electron beam lithography, Etching, Line width roughness, Directed self assembly, Nanoimprint lithography, Critical dimension metrology, Photoresist processing, Semiconducting wafers, System on a chip

Showing 5 of 10 publications
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