Dr. Florian Gstrein
Research manager at Intel Corp
SPIE Involvement:
Conference Program Committee | Author
Publications (4)

PROCEEDINGS ARTICLE | March 20, 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Capillaries, Image processing, Photoresist materials, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers, Photoresist developing, Liquids

PROCEEDINGS ARTICLE | March 20, 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Polymethylmethacrylate, Etching, Dry etching, Annealing, Scanning electron microscopy, Photoresist materials, Directed self assembly, Wet etching, Picosecond phenomena, Photoresist developing

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: FT-IR spectroscopy, Optical lithography, Nanoparticles, Metals, Spectroscopy, Ultraviolet radiation, Particles, Scanning electron microscopy, Extreme ultraviolet, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | March 28, 2014
Proc. SPIE. 9054, Advanced Etch Technology for Nanopatterning III
KEYWORDS: Lithography, Optical lithography, Etching, Metals, Copper, Dielectrics, Chemistry, Process control, Critical dimension metrology, Plasma

Conference Committee Involvement (4)
Extreme Ultraviolet (EUV) Lithography X
24 February 2019 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography IX
26 February 2018 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VIII
27 February 2017 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VII
22 February 2016 | San Jose, California, United States
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