Florian Knorr
Engineer at Leibniz-Institut für Photonische Technologien eV
SPIE Involvement:
Author
Publications (2)

SPIE Journal Paper | 3 September 2019
NPh Vol. 6 Issue 04

Proceedings Article | 18 March 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Extreme ultraviolet, Metrology, Extreme ultraviolet lithography, Radiometry, Reflectometry, Pellicles, Lifetime testing equipment, Mirrors, Optical filters, Spatial filters, Protactinium, Sensors

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