Dr. Frances A. Houle
Research Staff Member at Lawrence Berkeley National Lab
SPIE Involvement:
Publications (32)

Proceedings Article | 10 April 2024 Presentation
Jacob Milton, Frances Houle, Samuel Blau
Proceedings Volume 12957, 129571F (2024) https://doi.org/10.1117/12.3012420
KEYWORDS: Extreme ultraviolet lithography, Modeling, Photoresist materials, Stochastic processes, Photoresist developing, Ions, Ionization, Image acquisition, Copolymers, Chemically amplified resists

Proceedings Article | 22 November 2023 Presentation
Jacob Milton, Frances Houle, Samuel Blau
Proceedings Volume PC12750, PC1275009 (2023) https://doi.org/10.1117/12.2687731
KEYWORDS: Extreme ultraviolet lithography, Chemical reactions, Polymers, Modeling, Ionization, 3D modeling, Thermodynamics, Stochastic processes, Process modeling, Photoresist materials

Proceedings Article | 30 April 2023 Presentation
Ricardo Ruiz, Stacey Bent, Samuel Blau, Brett Helms, Frances Houle, Oleg Kostko, Patrick Naulleau, Paul Nealey, Christopher Ober, Dahyun Oh, Rachel Segalman, Cheng Wang
Proceedings Volume PC12497, PC124970J (2023) https://doi.org/10.1117/12.2662699
KEYWORDS: Optical lithography, Stochastic processes, Photoresist materials, Molecular self-assembly, Materials processing, Extreme ultraviolet lithography, Extreme ultraviolet, X-ray characterization, Semiconductors, Semiconductor manufacturing

Proceedings Article | 1 April 2009 Paper
Nicolae Maxim, Frances Houle, Jeroen Huijbregtse, Vaughn Deline, Hoa Truong, Willem van Schaik
Proceedings Volume 7273, 72733Z (2009) https://doi.org/10.1117/12.813726
KEYWORDS: Silicon, Polymers, Nitrogen, Carbon, Semiconducting wafers, Calibration, Ultraviolet radiation, Sensors, Lithography, Photoresist materials

Proceedings Article | 23 March 2009 Paper
John Bruley, Geoffrey Burr, Robert Davis, Philip Flaitz, William Hinsberg, Frances Houle, Dolores Miller, Michael Pike, Jed Rankin, Alfred Wagner, Andrew Watts
Proceedings Volume 7272, 727215 (2009) https://doi.org/10.1117/12.813934
KEYWORDS: Photomasks, Chromium, Semiconducting wafers, Binary data, Manufacturing, Diffusion, Transmission electron microscopy, Roads, Photoresist materials, Oxidation

Showing 5 of 32 publications
Conference Committee Involvement (2)
Alternative Lithographic Technologies
24 February 2009 | San Jose, California, United States
Advances in Resist Technology and Processing XX
24 February 2003 | Santa Clara, California, United States
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