Dr. Frances A. Houle
Research Staff Member at Lawrence Berkeley National Lab
SPIE Involvement:
Author
Publications (29)

Proceedings Article | 1 April 2009 Paper
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Carbon, Lithography, Sensors, Calibration, Polymers, Ultraviolet radiation, Silicon, Nitrogen, Photoresist materials, Semiconducting wafers

Proceedings Article | 23 March 2009 Paper
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Roads, Diffusion, Manufacturing, Chromium, Transmission electron microscopy, Photoresist materials, Photomasks, Semiconducting wafers, Binary data, Oxidation

Proceedings Article | 18 March 2009 Paper
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Roads, Quartz, Sputter deposition, Polymers, Metals, Ultraviolet radiation, Silicon, Humidity, Adhesives, Protactinium

Proceedings Article | 17 October 2008 Paper
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Data modeling, Lenses, Inspection, Distortion, Pellicles, Transmittance, Photomasks, Fermium, Immersion lithography, Adhesives

Proceedings Article | 14 March 2008 Paper
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Oxides, Quartz, Polymers, Metals, Ultraviolet radiation, Interfaces, Silicon, Atomic layer deposition, Photoresist processing, Adhesives

Showing 5 of 29 publications
Conference Committee Involvement (2)
Alternative Lithographic Technologies
24 February 2009 | San Jose, California, United States
Advances in Resist Technology and Processing XX
24 February 2003 | Santa Clara, California, United States
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