Dr. Frances A. Houle
Research Staff Member at Lawrence Berkeley National Lab
SPIE Involvement:
Conference Program Committee | Author
Publications (29)

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Silicon, Polymers, Nitrogen, Carbon, Semiconducting wafers, Calibration, Ultraviolet radiation, Sensors, Lithography, Photoresist materials

Proceedings Article | 23 March 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Photomasks, Chromium, Semiconducting wafers, Binary data, Manufacturing, Diffusion, Transmission electron microscopy, Roads, Photoresist materials, Oxidation

Proceedings Article | 18 March 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Quartz, Metals, Adhesives, Silicon, Sputter deposition, Ultraviolet radiation, Humidity, Protactinium, Roads, Polymers

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Pellicles, Photomasks, Adhesives, Data modeling, Inspection, Distortion, Transmittance, Immersion lithography, Lenses, Fermium

Proceedings Article | 14 March 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Metals, Oxides, Interfaces, Photoresist processing, Adhesives, Silicon, Quartz, Atomic layer deposition, Ultraviolet radiation, Polymers

Proceedings Article | 22 March 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Ultraviolet radiation, Fluorine, Polymers, Glasses, Silicon, Polymerization, Data conversion, Scanning electron microscopy, Dielectrics, Materials processing

Showing 5 of 29 publications
Conference Committee Involvement (2)
Alternative Lithographic Technologies
24 February 2009 | San Jose, California, United States
Advances in Resist Technology and Processing XX
24 February 2003 | Santa Clara, California, United States
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