Even with the large-scale adaption of EUV Lithography to High Volume Manufacturing, numerous device-critical product layers will still be exposed with Immersion Lithography Technology and therefore ZEISS and ASML keep investing in the next generation immersion extensions. The overlay accuracy has to be controlled over the exposure field more accurately and also on a higher spatial frequency grid. To support this functionality, a novel manipulator will be incorporated into the next generation of immersion optics, which is especially well-suited for high frequent distortion tuning. Furthermore, lens distortion measurements and adjustments will be done based on more field points. In this paper, we will show the unique correction functionality of this manipulator and show its various application fields for improving the performance of ASML scanners.