Dr. Francis Goodwin
SPIE Involvement:
Publications (6)

Proceedings Article | 19 March 2018 Presentation + Paper
Proceedings Volume 10583, 105830D (2018) https://doi.org/10.1117/12.2297027
KEYWORDS: Aberration theory, Zernike polynomials, Diffraction, Extreme ultraviolet lithography, Wavefronts, Error analysis, Scanners, Photomasks, Overlay metrology, Lithography

Proceedings Article | 16 October 2017 Paper
Proceedings Volume 10451, 104510S (2017) https://doi.org/10.1117/12.2280339
KEYWORDS: Pellicles, Photomasks, Extreme ultraviolet, Nanoimprint lithography, Extreme ultraviolet lithography, Transmittance, Temporal coherence, Particles, Nickel, High volume manufacturing

Proceedings Article | 30 March 2017 Presentation + Paper
Michael Crouse, Lars Liebmann, Vince Plachecki, Mohamed Salama, Yulu Chen, Nicole Saulnier, Derren Dunn, Itty Matthew, Stephen Hsu, Keith Gronlund, Francis Goodwin
Proceedings Volume 10148, 101480H (2017) https://doi.org/10.1117/12.2260865
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Stochastic processes, Optical lithography, Lithography, Tolerancing, Computational lithography, Design for manufacturability, Manufacturing, Back end of line, Source mask optimization, Photomasks, Logic, Optical proximity correction, Nanoimprint lithography

Proceedings Article | 28 March 2017 Paper
Lei Sun, Tsunehito Kohyama, Kuniaki Takeda, Hiroto Nozawa, Yuji Asakawa, Taher Kagalwala, Granger Lobb, Frank Mont, Xintuo Dai, Shyam Pal, Wenhui Wang, Jongwook Kye, Francis Goodwin
Proceedings Volume 10145, 101452D (2017) https://doi.org/10.1117/12.2258623
KEYWORDS: Process control, Metrology, Optical metrology, Defect inspection, Inspection, Semiconducting wafers, Critical dimension metrology, Finite element methods, Wafer-level optics, Line edge roughness, Lithography, Optics manufacturing

Proceedings Article | 27 March 2017 Paper
Proceedings Volume 10143, 101431S (2017) https://doi.org/10.1117/12.2258121
KEYWORDS: Data modeling, Photomasks, Reflectivity, Extreme ultraviolet, Optical proximity correction, Monte Carlo methods, Extreme ultraviolet lithography, Reflectors, Statistical analysis, Electromagnetic theory, Surface roughness, Silicon, Molybdenum, Scanning tunneling microscopy

Showing 5 of 6 publications
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