Dr. Francis M. Houlihan
Senior Staff Scientist
SPIE Involvement:
Author
Publications (42)

Proceedings Article | 1 April 2009 Paper
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Polymers, Coating, Fourier transforms, Electroluminescence, Plasma etching, Head-mounted displays, Arsenic, Binary data, Prototyping, Bottom antireflective coatings

Proceedings Article | 15 April 2008 Paper
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Reticles, Polymers, Silicon, Coating, Reflectivity, Fourier transforms, Plasma etching, Prototyping, Plasma, Bottom antireflective coatings

Proceedings Article | 2 April 2007 Paper
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Carbon, Lithography, Antireflective coatings, Etching, Silicon, Reflectivity, Fourier transforms, Photomasks, Silicon carbide, Semiconducting wafers

Proceedings Article | 2 April 2007 Paper
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Polymers, Resistance, Fourier transforms, Fluorine, Photoresist processing, Semiconducting wafers, Arsenic, Prototyping, Bottom antireflective coatings

Proceedings Article | 11 April 2006 Paper
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Polymers, Fourier transforms, Photoresist materials, Line width roughness, Immersion lithography, Line edge roughness, Thin film coatings, Photoresist processing, Semiconducting wafers

Showing 5 of 42 publications
Proceedings Volume Editor (2)

SPIE Conference Volume | 24 August 2001

SPIE Conference Volume | 23 June 2000

Conference Committee Involvement (3)
Advances in Resist Technology and Processing XX
24 February 2003 | Santa Clara, California, United States
Advances in Resist Technology and Processing XVIII
26 February 2001 | Santa Clara, CA, United States
Advances in Resist Technology and Processing XVII
28 February 2000 | Santa Clara, CA, United States
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