Dr. Frank-Michael Kamm
Sr Engineer R&D at Qimonda Dresden GmbH & Co OHG
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 29 March 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Coating, Photomasks, Beam shaping, Photoresist processing, Semiconducting wafers, Prototyping, Chemically amplified resists

Proceedings Article | 23 March 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Lithography, Image processing, Scanning electron microscopy, Printing, Projection systems, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers

Proceedings Article | 6 May 2005
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Multilayers, Cadmium, Imaging systems, Scanning electron microscopy, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Binary data

Proceedings Article | 6 December 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reflectors, Multilayers, Cadmium, Scanning electron microscopy, Photoresist materials, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 2 June 2004
Proc. SPIE. 5504, 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Etching, Materials processing, Reflectivity, Chromium, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Tantalum, Semiconducting wafers

Proceedings Article | 28 August 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Diffractive optical elements, Etching, Polymers, Chromium, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Plasma etching, Photoresist processing, Plasma

Showing 5 of 11 publications
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