Dr. Frank E. Abboud
General Manager at Intel Corp
SPIE Involvement:
Scholarship Committee | Fellow status | Conference Program Committee | Conference Chair | Symposium Chair | Author | Editor
Publications (34)

PROCEEDINGS ARTICLE | October 21, 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Electron beam lithography, Diffusion, Monte Carlo methods, Data processing, Photomasks, Optical proximity correction, Raster graphics, Computer aided design, Semiconducting wafers, Vestigial sideband modulation

SPIE Journal Paper | June 25, 2013
JM3 Vol. 12 Issue 02
KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Process modeling, Instrument modeling, Reflectivity, Defect inspection, Inspection, Mask making, Printing

SPIE Conference Volume | November 14, 2012

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Signal to noise ratio, Lithography, Electron beam lithography, Electrons, Photomasks, Beam shaping, Optical proximity correction, Raster graphics, Photomask technology, Vestigial sideband modulation

SPIE Conference Volume | October 13, 2011

PROCEEDINGS ARTICLE | April 5, 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Reticles, Metrology, Data modeling, Sensors, Etching, Manufacturing, Data processing, Critical dimension metrology, Performance modeling, Process modeling

Showing 5 of 34 publications
Conference Committee Involvement (16)
Photomask Technology
11 September 2017 | Monterey, California, United States
Photomask Technology
12 September 2016 | San Jose, California, United States
Alternative Lithographic Technologies VIII
22 February 2016 | San Jose, California, United States
Photomask Technology 2015
29 September 2015 | Monterey, California, United States
Alternative Lithographic Technologies VII
23 February 2015 | San Jose, California, United States
Showing 5 of 16 published special sections
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