Dr. Frank Barkusky
at KLA-Tencor Corp
SPIE Involvement:
Author
Publications (21)

PROCEEDINGS ARTICLE | May 3, 2013
Proc. SPIE. 8777, Damage to VUV, EUV, and X-ray Optics IV; and EUV and X-ray Optics: Synergy between Laboratory and Space III
KEYWORDS: Mirrors, Multilayers, Beam splitters, Reflection, Silicon, Reflectivity, Wavefronts, Extreme ultraviolet, Laser damage threshold, Plasma

PROCEEDINGS ARTICLE | April 8, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Gold, Mirrors, Multilayers, Silica, Silicon, Extreme ultraviolet, Laser damage threshold, EUV optics, Plasma, Absorption

PROCEEDINGS ARTICLE | March 23, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Gold, Mirrors, Multilayers, Silica, Silicon, Laser ablation, Extreme ultraviolet, Laser damage threshold, Plasma, Absorption

PROCEEDINGS ARTICLE | December 31, 2009
Proc. SPIE. 7504, Laser-Induced Damage in Optical Materials: 2009
KEYWORDS: Gold, Mirrors, Multilayers, Polymethylmethacrylate, Etching, Solids, Objectives, Extreme ultraviolet, EUV optics, Plasma

PROCEEDINGS ARTICLE | May 18, 2009
Proc. SPIE. 7361, Damage to VUV, EUV, and X-Ray Optics II
KEYWORDS: Carbon, Mirrors, Metrology, Sensors, Silicon, Plasmas, Reflectivity, Reflectometry, Extreme ultraviolet, Absorption

PROCEEDINGS ARTICLE | May 18, 2009
Proc. SPIE. 7361, Damage to VUV, EUV, and X-Ray Optics II
KEYWORDS: Gold, Mirrors, FT-IR spectroscopy, Polymethylmethacrylate, Etching, Polymers, Solids, Objectives, Extreme ultraviolet, Plasma

Showing 5 of 21 publications
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