Dr. Frank V. Belanger
Research Engineer at Entegris Inc
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | April 5, 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Reticles, Contamination, Quartz, Air contamination, Scanners, Manufacturing, Chromium, Pellicles, Humidity, Photomasks

PROCEEDINGS ARTICLE | April 5, 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Carbon, Optical components, Lithography, Contamination, Calibration, Digital filtering, Silicon, Adsorption, Semiconductor manufacturing, Chemical analysis

PROCEEDINGS ARTICLE | May 12, 2004
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Optical filters, Optical lithography, Contamination, Scanners, Silicon, Photoresist materials, Chemical analysis, Head-mounted displays, Chemical elements, Absorption

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