Dr. Frank A. Driessen
Senior Marketing Manager, Holistic Lithography at
SPIE Involvement:
Conference Program Committee | Author
Publications (20)

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Deep ultraviolet, Scanners, 3D modeling, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Algorithm development, Optimization (mathematics), Fiber optic illuminators

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Data modeling, Calibration, Etching, 3D modeling, Atomic force microscopy, Scanning electron microscopy, Process control, Photomasks, Semiconducting wafers

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Apodization, Multilayers, Scanners, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Metrology, Deep ultraviolet, Scanners, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 13, 2009
Proc. SPIE. 7275, Design for Manufacturability through Design-Process Integration III
KEYWORDS: Silicon, Manufacturing, Laser induced breakdown spectroscopy, Design for manufacturing, Optical proximity correction, Optimization (mathematics), Semiconducting wafers, Tolerancing, Yield improvement, Standards development

PROCEEDINGS ARTICLE | October 17, 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Defect detection, Databases, Manufacturing, Inspection, Data processing, Photomasks, Optical proximity correction, Mask making, Data conversion, Defect inspection

Showing 5 of 20 publications
Conference Committee Involvement (6)
Photomask Technology
15 September 2009 | Monterey, California, United States
Photomask Technology
7 October 2008 | Monterey, California, United States
Photomask Technology
18 September 2007 | Monterey, California, United States
Photomask Technology
19 September 2006 | Monterey, California, United States
Photomask Technology
3 October 2005 | Monterey, California, United States
Showing 5 of 6 published special sections
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