Frank Goodwin
EUV Mask Defect Reduction Manager at SUNY Poly SEMATECH
SPIE Involvement:
Conference Program Committee | Author
Publications (47)

PROCEEDINGS ARTICLE | April 6, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Extreme ultraviolet, Inspection, Phase contrast, Photomasks, Extreme ultraviolet lithography, Defect inspection, Computer simulations, Infrared imaging, Phase shift keying, Defect detection

PROCEEDINGS ARTICLE | April 6, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Photomasks, Extreme ultraviolet, Reflectivity, Sputter deposition, Multilayers, Semiconducting wafers, Ion beams, Manufacturing, Silicon, EUV optics

PROCEEDINGS ARTICLE | April 6, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Photomasks, Extreme ultraviolet, Inspection, Extreme ultraviolet lithography, Silica, Deposition processes, Standards development, Manufacturing, Ruthenium, Reflectivity

PROCEEDINGS ARTICLE | July 28, 2014
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Ruthenium, Silicon, Extreme ultraviolet, Finite element methods, Interfaces, Oxides, Oxygen, Neodymium, Photomasks, Oxidation

PROCEEDINGS ARTICLE | July 28, 2014
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Photomasks, Extreme ultraviolet, Speckle, Line width roughness, Inspection, Atomic force microscopy, Lithography, Scattering, Scatter measurement, Line edge roughness

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Contamination, Extreme ultraviolet, Photomasks, Carbon, Transmission electron microscopy, Extreme ultraviolet lithography, Photons, Silicon, Semiconducting wafers, Ruthenium

Showing 5 of 47 publications
Conference Committee Involvement (8)
Extreme Ultraviolet (EUV) Lithography VII
22 February 2016 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VI
23 February 2015 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography V
24 February 2014 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography IV
25 February 2013 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography III
13 February 2012 | San Jose, California, United States
Showing 5 of 8 published special sections
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