Frank Holsteyns
at imec
SPIE Involvement:
Publications (5)

Proceedings Article | 10 April 2024 Presentation
Proceedings Volume PC12958, (2024)
KEYWORDS: Sustainability, Etching, Semiconductor manufacturing, Chemical mechanical planarization, Carbon, Atomic layer deposition, Nanostructures, Deposition processes, Very large scale integration, Vacuum

Proceedings Article | 13 June 2022 Presentation
Proceedings Volume PC12056, PC1205604 (2022)
KEYWORDS: Field effect transistors, Etching, Dry etching, Very large scale integration, Isotropic etching, Dielectrics, Gallium arsenide, Transistors, Superlattices, Sodium

Proceedings Article | 24 March 2020 Presentation
Proceedings Volume 11329, 113290Q (2020)
KEYWORDS: Silicon, Fin field effect transistors, Gallium arsenide, Critical dimension metrology, Plasma, Field effect transistors, Etching, Line edge roughness, Line width roughness, Transistors

Proceedings Article | 18 March 2019 Presentation
Proceedings Volume 10963, 109630L (2019)
KEYWORDS: Etching, Field effect transistors, Group IV semiconductors, Isotropic etching, Silicon, Gallium arsenide, Nanowires, Semiconductors, Transistors, Standards development

Proceedings Article | 24 March 2006 Paper
Frank Holsteyns, Lisa Cheung, Dieter Van Den Heuvel, Gino Marcuccilli, Gavin Simpson, Roland Brun, Andy Steinbach, Wim Fyen, Diziana Vangoidsenhoven, Paul Mertens, Mireille Maenhoudt
Proceedings Volume 6152, 61521U (2006)
KEYWORDS: Inspection, Semiconducting wafers, Scattering, Silicon, Light scattering, Immersion lithography, Signal to noise ratio, Laser scattering, Defect detection, Optical lithography

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