Frank Holsteyns
at IMEC
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 18 March 2019
Proc. SPIE. 10963, Advanced Etch Technology for Nanopatterning VIII
KEYWORDS: Semiconductors, Etching, Gallium arsenide, Silicon, Transistors, Field effect transistors, Standards development, Group IV semiconductors, Isotropic etching, Nanowires

Proceedings Article | 24 March 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Signal to noise ratio, Optical lithography, Defect detection, Scattering, Silicon, Light scattering, Inspection, Laser scattering, Immersion lithography, Semiconducting wafers

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