Frank Hsieh
Section Manager at Toppan Chunghwa Electronics Co Ltd
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | August 20, 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Manufacturing, Reliability, Printing, Photomasks, Optical proximity correction, Mask making, Computer aided design, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | August 20, 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Reticles, Contamination, Air contamination, Manufacturing, Inspection, Control systems, Pellicles, Photomasks, Semiconducting wafers, 193nm lithography

PROCEEDINGS ARTICLE | December 17, 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Optical lithography, Quartz, Manufacturing, Photomasks, Optical proximity correction, Neodymium, Semiconducting wafers, Binary data, Phase shifts

PROCEEDINGS ARTICLE | August 28, 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Phase shifting, Metrology, Etching, Quartz, Image processing, Printing, Process control, Photomasks, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | August 28, 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Lithography, Reticles, Etching, Quartz, Manufacturing, Image transmission, Transmittance, Photomasks, Nanoimprint lithography, Phase shifts

PROCEEDINGS ARTICLE | August 28, 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Lithography, Reticles, Manufacturing, Image resolution, Chromium, Scanning electron microscopy, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Showing 5 of 7 publications
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