Dr. Frank Katzwinkel Profile

Dr. Frank Katzwinkel

at Qimonda Dresden GmbH & Co OHG

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Author

Publications (3)

Proceedings Article | 25 October 2007 Paper

Wafer inspection as alternative approach to mask defect qualification

Christian Holfeld, Frank Katzwinkel, Uwe Seifert, Andreas Mothes, Jan Hendrik Peters

Proceedings Volume 6730, 673023 (2007) https://doi.org/10.1117/12.746398

KEYWORDS: Photomasks, Inspection, Wafer inspection, Semiconducting wafers, Printing, Defect detection, Defect inspection, SRAF, Lithography, Optical proximity correction

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Proceedings Article | 20 October 2006 Paper

Inspectability and printability of lines and spaces halftone masks for the advanced DRAM node

Arndt Dürr, Karsten Gutjahr, Jan Heumann, Martin Stengl, Frank Katzwinkel, Andreas Frangen, Thomas Witte

Proceedings Volume 6349, 63493O (2006) https://doi.org/10.1117/12.693061

KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Printing, Scanning electron microscopy, Critical dimension metrology, Manufacturing, Halftones, Solids

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Proceedings Article | 15 March 2006 Paper

193-nm immersion photomask image placement in exposure tools

Eric Cotte, Benjamin Alles, Timo Wandel, Gunter Antesberger, Silvio Teuber, Manuel Vorwerk, Andreas Frangen, Frank Katzwinkel

Proceedings Volume 6154, 61541F (2006) https://doi.org/10.1117/12.656373

KEYWORDS: Photomasks, Image registration, Etching, Semiconducting wafers, Data analysis, Optical lithography, Lithography, Thermal effects, Electron beam lithography, Numerical simulations

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