Frank Laske
Projectmanager at KLA MIE GmbH
SPIE Involvement:
Author
Publications (33)

Proceedings Article | 20 March 2020
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Metrology, Calibration, Scanning electron microscopy, Optical calibration, Overlay metrology

Proceedings Article | 12 October 2018
Proc. SPIE. 10810, Photomask Technology 2018

Proceedings Article | 19 September 2018
Proc. SPIE. 10775, 34th European Mask and Lithography Conference
KEYWORDS: Lithography, Reticles, Metrology, Manufacturing, Image registration, Photomasks, Extreme ultraviolet, Semiconducting wafers, Overlay metrology

Proceedings Article | 12 June 2018
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Reticles, Metrology, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Overlay metrology

Proceedings Article | 13 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Lithography, Reticles, Metrology, Manufacturing, Image registration, Time metrology, Photomasks, Extreme ultraviolet, Semiconducting wafers, Overlay metrology

Showing 5 of 33 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top