Dr. Frank Scholze
Head of Group "EUV Radiometry" at Physikalisch-Technische Bundesanstalt
SPIE Involvement:
Author
Area of Expertise:
EUV radiometry , X-ray detectors , EUV scatterometry , EUV reflectometry , multilayer mirrors
Websites:
Profile Summary

born 30.09.1961 Berlin,
1982-1987 Physics studies at TU Dresden, graduated with a work on x-ray fluorescence analysis,
1987-1991 working on x-ray detectors at the Centre for scientific instrumentation of the Academy of Sciences,
since 1991 with the X-ray radiometry laboratory of PTB at BESSY
1997 PhD at TU Berlin, internal quantum yield of silicon in the soft X-ray spectral range
working on EUV and soft x-ray detector calibration and optical components characterization,
development of measurement methods for the characterization of components for EUV Lithography
and x-ray scattering methods for the characterization of structured surfaces.
Head of the working group for EUV radiometry.
Publications (106)

PROCEEDINGS ARTICLE | October 10, 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Refractive index, Metals, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Material characterization, Tellurium

PROCEEDINGS ARTICLE | October 9, 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Optical components, Mirrors, Reflectivity, Reflectometry, Transmittance, Extreme ultraviolet, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | August 2, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, Etching, Atomic force microscopy, Transmission electron microscopy, Signal processing, Photomasks, Extreme ultraviolet, Semiconducting wafers

PROCEEDINGS ARTICLE | July 6, 2018
Proc. SPIE. 10699, Space Telescopes and Instrumentation 2018: Ultraviolet to Gamma Ray
KEYWORDS: Telescopes, Mirrors, Cameras, Sensors, Calibration, Interferometry, Frequency modulation, Extreme ultraviolet, Fermium, Optical alignment

PROCEEDINGS ARTICLE | April 23, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Scattering, Scanners, Particles, Silicon, Hydrogen, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Nanostructures, Diffraction, Scattering, Sensors, X-rays, Laser scattering, Scatterometry, Extreme ultraviolet, Charge-coupled devices, Diffraction gratings

Showing 5 of 106 publications
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